YAC has developped the first batch type Ashing System using the plasma technology in Ashing process for semiconductors in Japan.
Thereafter YAC has been offerring manufacturing process technic, which is used in surface reforming and in the field of sterilization.
The PACK series is the desk top model, which a pump and the RF Gen. are packable in an special rack.

Standard Specification

Model PACK Series

Chamber Size 300φ x 400L
RF Power 1000W
Plasma Type Parallel Electrode or Co-axial Electrode
RF Genarator RF 13.56MHz(or4MHz),MAX 20KW
Process Gas O2, CF4, (Max. 3 Lines)

Please feel free to contact us for details.

Inquiry about our products.

Sales Dept.

Call: +81-42-546-2870