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Anneal           specification
 
   
 
Basic Spec. Model : YHR SERIES
 Target Process Crystallzation (Amorphous-Silicon, micro-Crystal)
:Activation
:Annealing
 Features :Quick responce High/Low temperature control.
 Rise up rate 4 degree C / sec. (MAX)
 Come down rate 1 degree C / sec.
:Up gread and zone heat source makes a stable temperature.
 +/- 3 degree C (The inner area of 10mm from Glasses edge)
:High temperature, (〜750 degree C) the fewest warp and strain
 for the glass board.
:Use the new developed glass board holding and transfer method.
:High mass production, 20,000 pieces / month.
:1 minute through put ( at 4 chamber configuration )
 Main Specification :Process board size :300x 400mm class〜 730x 920mm class
    (G6 Deveioping)
:Process chamber : 1 〜 6
:Temperature range : 300 degree C 〜 750 degree C

:Process Gas : N2
:Establishment : Atmosphere
 
 
 
 
 

Y.A.C. Co., Ltd. Plasma System (PS) Division 
Tel : +81-42-546-2885

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